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Reliability of Ultrathin High-K Dielectrics on Chemical-Vapor Deposited 2D Semiconductors

Zhihao Yu, Hongkai Ning, Chao-Ching Cheng, Weisheng Li, Lei Liu, Wanqing Meng, Zhongzhong Luo, Taotao Li, Songhua Cai, Peng Wang, Wen-Hao Chang, Chao-Hsin Chien, Yi Shi, Yong Xu, Lain-Jong Li, Xinran Wang

DOI
10.17023/tyw1-wg74
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