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Hydrogen Absorption Method Using HfOx in Crystalline In-Ga-Zn Oxide FETs for NVM Applications

T. Ono, Y. Yangisawa, Y. Komatsu, T. Aoki, Y. Jimbo, S. Ito, Y. Yamane, N. Okuno, H. Kunitake, H. Komagata, S. Sasgawa, S. Yamazaki

DOI
10.17023/0h86-p050
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