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Anti Ferroelectric HfxZr1-xO2 Capactiors for High Density 3D Embedded DRAM

Sou-Chi Chang, Nazila Haratipour, Shriram Shivaraman, Tobias Brown-Heft, Jason Peck, Chia-Ching Lin, I-Cheng Tung, Devin Merrill, Huiying Liu, Che-Yun Lin, Fatih Hamzaoglu, Matthew Metz, Ian Young, Jack Kavalieros, Uygar Avci

DOI
10.17023/ck4x-vt48
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